HIGH PURITY TRI-METHYL GALLIUM (99.999%)

Introduction :

Trimethylgallium, Ga(CH₃)₃ , often abbreviated to TMG or TMGa, commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors used in fabricaton of optoelectronic devices and solar panels. In our synthethetic method the intermediate adduct of TMG is prepared which has no such limitation & can be stored for long time without any stringent safety precautions.

The emphasis of Government on semiconductor chips manufacturing in India, will boost the demand indigenously sourced raw materials.

Specification :

• Stoichimetric ratio of magnesium and gallium are heated together to form an alloy.
• Grey lustrous solid, which can be ground to powder during the synthesis of organometallic compounds.ith special emphasis of the Government of India on setting semiconductor device manufacturing firms in India, the demand for indigenously sourced raw materials is expected to rise.

Salient features :

• Presently TMG is not indigenously manufactured and needs to be imported.
• Use of hygroscopic and expensive chemicals like GaCl₃ and MeLi or toxic R₂Hg can be avoided.
• In our synthetic method the intermediate adduct of TMG is prepared which has no such limitation and can be stored for long time without any stringent safety precautions.
• Synthesized from readily available raw material sourced from local market.
  

Application :

• Trimethylgallium,Ga(CH₃)₃, TMG or TMGa is commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors, such as:-
  • gallium arsenide (GaAs) (used in space applications, blue LED material galium nitride (GaN)
  • gallium phosphide (GaP), gallium antimonide (GaSb) (used in fabrication of optoelectronic devices)
  • copper indium gallium sulfide and copper indium gallium selenide (CIGS) (used in manufacture of high efficiency solar panels)
• TMG is used for preparation of thin films of gallium based semiconductor materials which are used in micro-electronic and high speed devices.
• TMG is routinely used for preparation of GaAs, GaN, GaP thin films.
  

Infrastructure :
A chemical laboratory having a vacuum pump (1.5HP, 2 mbar) Fume hood (500 m³/h) & Stainless steel 304 L Glove Box (1m (H) x 1m (W) x 0.5 m(D) is required with a well ventilated area of 10ft x 15 ft is sufficient for production of TMG.

Raw Materials :
The raw materials are easily available in local market.

Manpower
Two chemists (B.Sc. in Chemistry) & Laboratory technician (for maintenance of facilities) are required for the production.