Compact SMPS based Sputter Ion Pump Power Supply

Sputter ion pumps find extensive use in high vacuum systems where a “clean” vacuum is desired. In contrast to other common UHV pumps, such as turbo molecular pumps and diffusion pumps, ion pumps have no moving parts and use no oil. They are therefore clean, need little maintenance, and produce no vibrations. These advantages make ion pumps well-suited for use in scanning probe microscopy and other high-precision apparatuses.

The compact switched mode triode sputter ion pump power supply made in BARC is based on a half bridge dc to dc converter operating at 20kHz resulting in a drastic size reduction of around 75% over conventional mains frequency operated ion pump power supplies. This supply can be used with Triode Sputter Ion Pumps having pumping speeds up to 140 lps and for Thin film deposition by DC magnetron sputtering technique.

Facility and Manpower Requirement

One electronics engineer and one technical assistant with general electronics test and assembly facility is sufficient. Experience in working with high voltage devices is expected. 

For details contact :
   

    Head, Technology Transfer & Collaboration Division,
    BHABHA ATOMIC RESEARCH CENTRE,
    TROMBAY, MUMBAI - 400 085
    Fax : 091-022-25505151
    Email : technology@barc.gov.in